Author: shelbyvanotterlo

Hitachi High-Tech Corporation today announced the Development of its Electron Beam Area Inspection System GS1000. This, newly developed tool, offers precise and fast e-beam inspection by using common platform, which is based on proven Hitachi High-Tech’s high-speed inspection SEM’s, Hitachi High-Tech’s expertise in market leading CD-SEM(1) technology, and high-speed and massive measurements. Electron Beam Area Inspection System GS1000 Demand for the cutting-edge semiconductor devices mass-production is being drastically increased, driving introduction of EUV Lithography to enable smaller semiconductor devices. Hitachi High-Tech is contributing to the increased productivity in modern semiconductor industry by providing fast e-beam GS1000 system to facilitate massive ... Read more